DocumentCode
1005139
Title
Temperature-dependent characteristics of MBE-grown GaAs p+-v-p+-v-n+ regenerative switching device
Author
Chang, C.Y. ; Wang, Y.H. ; Liu, W.C. ; Liao, S.A.
Author_Institution
National Cheng Kung University, Semiconductor & System Laboratories, Tainan, Republic of China
Volume
21
Issue
1
fYear
1985
Firstpage
24
Lastpage
25
Abstract
The thick GaAs p+-v-p+-v-n+ regenerative switching diode was fabricated by the MBE technique on n+-GaAs substrate. Temperature-dependent operational parameters, including switching voltage VS, switching current IS, holding voltage VH and holding current I, were investigated. It is found that VS, VH and IH decrease from 19 V, 3.6 V and 1.2 mA to 10.2 V, 2 V and 130 ¿A, respectively, with decreasing measurement temperature from room temperature to 77 K, while IS increases from 5 ¿A to 45 ¿A. However, VS takes a more complicated `M¿-shape characteristic from 77 K to 323 K which indicates a more complicated transport mechanism.
Keywords
III-V semiconductors; gallium arsenide; molecular beam epitaxial growth; semiconductor diodes; semiconductor switches; GaAs; III-V semiconductors; MBE technique; holding current; holding voltage; n+-GaAs substrate; p+-¿-p+-¿-n + regenerative switching device; switching current; switching voltage; temperature-dependent characteristics; transport mechanism;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19850019
Filename
4250823
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