Micromachined chromium nitride thin-film pressure sensor for high temperature applications

The fabrication and characteristics of a micromachined chromium nitride (Cr-N) thin-film pressure sensor with high overpressure tolerance for high temperature applications are presented. The proposed pressure sensor consists of a Cr-N thin-film, patterned after a Wheatstone bridge configuration, and then sputter-deposited onto thermally oxidised Si membranes with a buried cavity for overpressure tolerance and an Al interconnection layer. This device is very suitable for high temperature integrated pressure sensors.