• DocumentCode
    1006347
  • Title

    Grain growth of rapid quenching high silicon-iron alloys

  • Author

    Arai, K.I. ; Tsutsumitake, H. ; Ohmori, K. ; Arai, Kenta ; Tsutsumitake, H. ; Ohmori, Kenji

  • Author_Institution
    Tohoku University, Sendai, Japan
  • Volume
    20
  • Issue
    5
  • fYear
    1984
  • fDate
    9/1/1984 12:00:00 AM
  • Firstpage
    1463
  • Lastpage
    1465
  • Abstract
    In 6.5wt% silicon-iron ribbons prepared by a rapid quenching roll method, grains of 10μm in diameter were observed to grow from surfaces to the inner part of ribbons. When the annealing temperature was about 700°C, the primary recrystallization was observed near the middle of the ribbon thickness, and at the annealing temperature of 950°C, the grain size became 30-40μm. When ribbons were annealed at 1100°C, grains grew with a
  • Keywords
    Annealing; Argon; Furnaces; Grain size; Iron; Magnetostriction; Saturation magnetization; Silicon alloys; Soft magnetic materials; Temperature;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1984.1063487
  • Filename
    1063487