• DocumentCode
    1006855
  • Title

    AlGaAs/GaAs Heterojunction bipolar power transistors

  • Author

    Kim, Bumki ; Tserng, Hua-Quen ; Tiku, S.K. ; Shih, H.D.

  • Author_Institution
    Texas Instruments Incorporated, Central Research Laboratories, Dallas, USA
  • Volume
    21
  • Issue
    7
  • fYear
    1985
  • Firstpage
    258
  • Lastpage
    259
  • Abstract
    An AlGaAs/GaAs heterojunction bipolar transistor with a total emitter periphery of 320 ¿m has been developed for power amplifier applications. For the base contact, Zn diffusion was used to convert the n-type emitter material into p-type with a doping of ¿1.0 × 1020 cm¿3. Because of the highly doped layer, contact resistivity was extremely low (5 × 10¿7 ¿cm2). At 3 GHz, a CW output power of 320 mW with 7 dB gain and 30% power-added efficiency was obtained. Under pulsed operation, the output power increased to 500 mW with 6 dB gain and 40% power-added efficiency. With further device structure optimisations, the power performance of heterojunction bipolar transistors is expected to rival, or even surpass, that of the GaAs MESFETs.
  • Keywords
    III-V semiconductors; aluminium compounds; bipolar transistors; gallium arsenide; power transistors; AlGaAs/GaAs heterojunction bipolar power transistors; CW output power 320 mW; Zn diffusion; contact resistivity; highly doped layer; power amplifier applications; pulsed operation; total emitter periphery 320 microns;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19850183
  • Filename
    4251005