DocumentCode :
1006855
Title :
AlGaAs/GaAs Heterojunction bipolar power transistors
Author :
Kim, Bumki ; Tserng, Hua-Quen ; Tiku, S.K. ; Shih, H.D.
Author_Institution :
Texas Instruments Incorporated, Central Research Laboratories, Dallas, USA
Volume :
21
Issue :
7
fYear :
1985
Firstpage :
258
Lastpage :
259
Abstract :
An AlGaAs/GaAs heterojunction bipolar transistor with a total emitter periphery of 320 ¿m has been developed for power amplifier applications. For the base contact, Zn diffusion was used to convert the n-type emitter material into p-type with a doping of ¿1.0 × 1020 cm¿3. Because of the highly doped layer, contact resistivity was extremely low (5 × 10¿7 ¿cm2). At 3 GHz, a CW output power of 320 mW with 7 dB gain and 30% power-added efficiency was obtained. Under pulsed operation, the output power increased to 500 mW with 6 dB gain and 40% power-added efficiency. With further device structure optimisations, the power performance of heterojunction bipolar transistors is expected to rival, or even surpass, that of the GaAs MESFETs.
Keywords :
III-V semiconductors; aluminium compounds; bipolar transistors; gallium arsenide; power transistors; AlGaAs/GaAs heterojunction bipolar power transistors; CW output power 320 mW; Zn diffusion; contact resistivity; highly doped layer; power amplifier applications; pulsed operation; total emitter periphery 320 microns;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19850183
Filename :
4251005
Link To Document :
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