Title :
Large area, low capacitance Si(Li) detectors for high rate X-ray applications
Author :
Rossington, C.S. ; Fine, P.M. ; Madden, N.W.
Author_Institution :
Dept. Eng. Sci., California Univ., CA, USA
fDate :
8/1/1993 12:00:00 AM
Abstract :
Large area, single-element Si(Li) detectors were fabricated using a novel geometry which yields detectors with reduced capacitance and hence reduced noise at short amplifier pulse-processing times. A typical device employing the new geometry with a thickness of 6 mm and an active area of 175 mm2 has a capacitance of only 0.5 pF, compared to 2.9 pF for a conventional planar device with equivalent dimensions. These low capacitance detectors, used in conjunction with low capacitance field effect transistors, will result in X-ray spectrometers capable of operating at very high count rates while still maintaining excellent energy resolution. The spectral response of the low capacitance detectors to a wide range of X-ray energies at 80 K is comparable to typical state-of-the-art conventional Si(Li) devices. In addition to their low capacitance, the new devices offer other advantages over conventional detectors. Detector fabrication procedures, I-V and C-V characteristics, noise performance, and spectral response to 2-60 keV X-rays are described
Keywords :
X-ray detection and measurement; capacitance; semiconductor counters; semiconductor device noise; 0.5 pF; 2 to 60 keV; 6 mm; 80 K; C-V characteristics; IV characteristics; Si(Li) detectors; Si:Li; X-ray spectrometers; high rate X-ray applications; large area; low capacitance; low capacitance field effect transistors; noise; spectral response; Capacitance; Energy resolution; FETs; Fabrication; Geometry; Noise reduction; Pulse amplifiers; Spectroscopy; X-ray detection; X-ray detectors;
Journal_Title :
Nuclear Science, IEEE Transactions on