• DocumentCode
    1009364
  • Title

    On Nb2O5growth and tunneling through Nb2O5

  • Author

    Halbritter, J.

  • Author_Institution
    Institut für Kernphysik II, Karlsruhe, Federal Republic of Germany
  • Volume
    21
  • Issue
    2
  • fYear
    1985
  • fDate
    3/1/1985 12:00:00 AM
  • Firstpage
    858
  • Lastpage
    861
  • Abstract
    Nb-Nb2O5interfaces are not only well known for deteriorated superconductivity but also for contradictory results on barrier height \\bar{\\phi} sampled by tunneling electrons. According to the Cabrera-Mott theory tunneling electrons define the oxide growth and thus oxidation and tunneling are linked. The oxidation of Nb is dominated by the growth of Nb2O5microcristallites and by oxygen diffusion. Both effects heavily strain the Nb-Nb2O5interface creating defects in Nb into which O is injected. This causes defects in Nb2O5as counterpart. These defect system weaken locally the superconductivity of Nb and the insulating properties of Nb2O5yielding so a serrated and eroded transition superconductor - insulator. In Nb3Sn-, NbC-, NbN-, ... oxidation the defect creation in the metal is reduced yielding so thinner and less defective Nb2O5than in Nb oxidation. Tunnel measurements allow quantitatively the following classification: -NbO6octahedra blocks (≥ 1 nm) with \\phi \\cong 1 eV, with -channels with \\phi* \\approx 0.1 eV in between and with -localized electron states n_{\\ell }(E_{F}) \\approx 10^{15} - 10^{20} /cm3eV as extended and localized defects. For Nb oxidation the channels are linked to NbOxlumps ( T_{c} \\approx = 0 K) at the Nb surface. These defects yield the tunnel channels and the tunnel anomalies encountered in Nb2O5dominating below 50 meV the tunnel current.
  • Keywords
    Superconducting materials; Tunnel effect; Capacitive sensors; Electrons; Insulation; Josephson junctions; Niobium compounds; Oxidation; Protection; Robustness; Superconductivity; Tunneling;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1985.1063741
  • Filename
    1063741