DocumentCode
1009945
Title
A method of determining impurity diffusion coefficients and surface concentrations of drift transistors
Author
Greenberg, L.S. ; Martowska, Z.A. ; Happ, W.W.
Author_Institution
Raytheon Manufacturing Co., Newton, Mass.
Volume
3
Issue
2
fYear
1956
fDate
4/1/1956 12:00:00 AM
Firstpage
97
Lastpage
99
Abstract
In order to control the electrical parameters of drift transistors, it was found necessary to control the impurity concentration gradient in the base. An extension of the space charge widening theory provides a method of calculating this gradient, the surface concentration, and the diffusion coefficient. By this method, the diffusion coefficient of arsenic into germanium at 725°C was found to be 3.1 × 10-12cm2/second and the initial surface concentration was of the order of 1020atoms/cm3. Universal graphs for design calculations and rapid reference are presented.
Keywords
Atomic measurements; Capacitance measurement; Electric variables; Extrapolation; Germanium; Heat treatment; Impurities; Meetings; Space charge; Space heating; Sparks; Surface treatment; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IRE Transactions on
Publisher
ieee
ISSN
0096-2430
Type
jour
DOI
10.1109/T-ED.1956.14111
Filename
1472030
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