• DocumentCode
    1010069
  • Title

    Low-Power Microwave Plasma Conductivity

  • Author

    Porteanu, Horia-Eugen ; Kühn, Silvio ; Gesche, Roland

  • Author_Institution
    Ferdinand-Braun-Inst. fur Hochstfrequen- ztechnik, Berlin
  • Volume
    37
  • Issue
    1
  • fYear
    2009
  • Firstpage
    44
  • Lastpage
    49
  • Abstract
    Plasma conductivity is of general interest for both fundamental research and specific applications. For this purpose, plasma equivalent impedance and complex conductivity are measured at 2.2 GHz, at pressures between 1 and 103 mbar, as a function of microwave power in a slot-type resonator, predominantly capacitively coupled to plasma. The plasma impedance is self-adjusting, maintaining a quasi-constant microwave amplitude. The sign of the imaginary part of the impedance (or conductivity) depends on pressure and, consequently, on electron density. The reactive part becomes significant if the Debye length is comparable with the size of the resonator and the plasma frequency is close to the microwave driving frequency.
  • Keywords
    plasma diagnostics; plasma pressure; plasma transport processes; Debye length; low-power microwave plasma conductivity; microwave driving frequency; plasma complex conductivity; plasma equivalent impedance; plasma frequency; quasiconstant microwave amplitude; slot-type resonator; Electromagnetic propagation in plasma media; plasma generation; plasma measurements; plasma properties;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2008.2005833
  • Filename
    4689393