DocumentCode
1010069
Title
Low-Power Microwave Plasma Conductivity
Author
Porteanu, Horia-Eugen ; Kühn, Silvio ; Gesche, Roland
Author_Institution
Ferdinand-Braun-Inst. fur Hochstfrequen- ztechnik, Berlin
Volume
37
Issue
1
fYear
2009
Firstpage
44
Lastpage
49
Abstract
Plasma conductivity is of general interest for both fundamental research and specific applications. For this purpose, plasma equivalent impedance and complex conductivity are measured at 2.2 GHz, at pressures between 1 and 103 mbar, as a function of microwave power in a slot-type resonator, predominantly capacitively coupled to plasma. The plasma impedance is self-adjusting, maintaining a quasi-constant microwave amplitude. The sign of the imaginary part of the impedance (or conductivity) depends on pressure and, consequently, on electron density. The reactive part becomes significant if the Debye length is comparable with the size of the resonator and the plasma frequency is close to the microwave driving frequency.
Keywords
plasma diagnostics; plasma pressure; plasma transport processes; Debye length; low-power microwave plasma conductivity; microwave driving frequency; plasma complex conductivity; plasma equivalent impedance; plasma frequency; quasiconstant microwave amplitude; slot-type resonator; Electromagnetic propagation in plasma media; plasma generation; plasma measurements; plasma properties;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2008.2005833
Filename
4689393
Link To Document