DocumentCode :
1010543
Title :
A new higher ambient transistor
Author :
Bowe, Jeffrey J.
Author_Institution :
AF Cambridge Res. Ctr., Laurence G. Hanscom Feild, Bedford, Mass
Volume :
3
Issue :
3
fYear :
1956
fDate :
7/1/1956 12:00:00 AM
Firstpage :
121
Lastpage :
123
Abstract :
Interest in high speed transistor switching circuits whose operation is unaffected by large changes in ambient temperature led to an investigation of silicon-germanium alloy point-contact transistors because of the larger forbidden energy gap of silicon-germanium alloys. In germanium transistors, as far as temperature stability is concerned, Ic0is particularly poor. Ic0is the value of collector current, at a given collector voltage, with no emitter current. The Ic0of germanium units tested rose rather linearly from 20°C. to about 65°C., with a gradient of 25 µa/°C. but then entered a region of run away. A number of point-contact transistors have been manufactured using 3 per cent silion-germanium (10 ohm-cm, n-type), and the parameters r11, r12, r22, α, fc0and Ic0at room temperature, and values of Ic0as a function of temperature have been measured. Results show that 3 per cent silicon-germanium transistors are as good as germanium transistors in all respects and better in temperature stability. The values of Ic0for silicon-germanium transistors rose linearly from 18° to about 95°C., with a gradient comparable to that of the germanium units below 65°C.
Keywords :
Circuit stability; Electron beams; Electron traps; Explosions; Gaussian processes; Germanium silicon alloys; Plasma temperature; Silicon alloys; Silicon germanium; Stability; Switching circuits; Temperature; Testing;
fLanguage :
English
Journal_Title :
Electron Devices, IRE Transactions on
Publisher :
ieee
ISSN :
0096-2430
Type :
jour
DOI :
10.1109/T-ED.1956.14170
Filename :
1472089
Link To Document :
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