• DocumentCode
    1011366
  • Title

    Enhancement of Kerr rotation with amorphous Si film

  • Author

    Nakamura, K. ; Asaka, T. ; Asari, S. ; Ota, Y. ; Itoh, A.

  • Author_Institution
    ULVAC Corporation, Chiba, Japan
  • Volume
    21
  • Issue
    5
  • fYear
    1985
  • fDate
    9/1/1985 12:00:00 AM
  • Firstpage
    1654
  • Lastpage
    1656
  • Abstract
    The enhancemant of the Kerr rotation angle with amorphous silicon film was investigated. Doping oxygen, nitrogen and carbon as impurity in a-Si films, the absorptance at the semiconductor laser wavelength becomes almost zero keeping high refractive index. With the a-Si film containing the impurities on magnetic film, large enhancement effect is achieved than that of dielectric film. With a-Si:24at%O films, θk becomes a large value of 80 min comparing with 25 min of Gd-Tb-Fe-Co single layer film. The \\sqrt{R} \\cdot {\\theta}k was improved 2 times higher than that of single layer film.
  • Keywords
    Amorphous semiconductor materials/devices; Magnetooptic Kerr effect; Magnetooptic memories; Semiconductor films; Silicon materials/devices; Amorphous materials; Amorphous silicon; Magnetic films; Nitrogen; Optical films; Refractive index; Semiconductor device doping; Semiconductor films; Semiconductor impurities; Semiconductor lasers;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1985.1063911
  • Filename
    1063911