DocumentCode
1011366
Title
Enhancement of Kerr rotation with amorphous Si film
Author
Nakamura, K. ; Asaka, T. ; Asari, S. ; Ota, Y. ; Itoh, A.
Author_Institution
ULVAC Corporation, Chiba, Japan
Volume
21
Issue
5
fYear
1985
fDate
9/1/1985 12:00:00 AM
Firstpage
1654
Lastpage
1656
Abstract
The enhancemant of the Kerr rotation angle with amorphous silicon film was investigated. Doping oxygen, nitrogen and carbon as impurity in a-Si films, the absorptance at the semiconductor laser wavelength becomes almost zero keeping high refractive index. With the a-Si film containing the impurities on magnetic film, large enhancement effect is achieved than that of dielectric film. With a-Si:24at%O films, θk becomes a large value of 80 min comparing with 25 min of Gd-Tb-Fe-Co single layer film. The
was improved 2 times higher than that of single layer film.
was improved 2 times higher than that of single layer film.Keywords
Amorphous semiconductor materials/devices; Magnetooptic Kerr effect; Magnetooptic memories; Semiconductor films; Silicon materials/devices; Amorphous materials; Amorphous silicon; Magnetic films; Nitrogen; Optical films; Refractive index; Semiconductor device doping; Semiconductor films; Semiconductor impurities; Semiconductor lasers;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1985.1063911
Filename
1063911
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