DocumentCode
1011894
Title
The dependence of magnetostriction of sputtered Co-Cr thin films on crystal structure
Author
Niimura, Yoshiro ; Naoe, Masahiko ; Niimura, Y. ; Naoe, Masayuki
Author_Institution
Tokyo Institute of Technology, Meguro-Ku, Tokyo, Japan
Volume
21
Issue
5
fYear
1985
fDate
9/1/1985 12:00:00 AM
Firstpage
1447
Lastpage
1449
Abstract
The saturation magnetostriction λ of the sputtered Co-Cr films deposited on the glass substrate by means of a Targets Facing Type of Sputtering (TFTS) system was evaluated with varying Cr content, substrate temperature and argon gas pressure. X-ray diffraction analysis (XRD) was unable to distinguish α-phase crystallites of fcc structure from ε-phase crystallites of hcp structure in all the film specimens prepared for evaluating λ, since the
Keywords
Magnetic film memories; Magnetostrictive materials/devices; Argon; Chromium; Crystallization; Glass; Magnetic analysis; Magnetostriction; Sputtering; Substrates; Temperature; X-ray diffraction;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1985.1063955
Filename
1063955
Link To Document