Reflow and burial of channel waveguides formed in sol-gel glass on Si substrates

Author

Syms, R.R.A. ; Holmes, A.S.

Author_Institution

Dept. of Electr. Eng., Imperial Coll. of Sci., Technol. & Med., London, UK

Volume

5

Issue

9

fYear

1993

Firstpage

1077

Lastpage

1079

Abstract

A reflow step and an improved burial procedure are demonstrated for channel waveguides formed in sol-gel glass on silicon substrates. Thick sol-gel films are deposited by repetitive spin coating and rapid thermal annealing, and etched to form ridge waveguides. Furnace heating is then used to melt both core and buffer layers simultaneously, providing a smooth surface for burial by further spin-coat deposition. Results are presented for typical core shapes, surface profiles after planarization, and optical insertion losses.<>

Keywords

annealing; integrated optics; optical films; optical glass; optical waveguides; optical workshop techniques; rectangular waveguides; sol-gel processing; Si; Si substrates; buffer layer melting; channel waveguides; core layer melting; core shapes,; furnace heating; improved burial procedure; optical insertion losses; planarization; rapid thermal annealing; reflow step; repetitive spin coating; smooth surface; sol-gel films; sol-gel glass; spin-coat deposition; surface profiles; Buffer layers; Coatings; Etching; Furnaces; Glass; Heating; Optical surface waves; Optical waveguides; Rapid thermal annealing; Silicon;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/68.257197

Filename

257197