Title :
Intrinsic stress in DC sputtered niobium
Author :
Booi, P.A.A. ; Livingston, C.A. ; Benz, S.P.
Author_Institution :
Nat. Inst. of Stand. & Technol., Boulder, CO, USA
fDate :
6/1/1993 12:00:00 AM
Abstract :
The intrinsic mechanical stress of DC-magnetron-sputtered Nb films is characterized as a function of sputtering parameters and target erosion. The zero-stress point shifts to lower cathode voltages as the target erodes. The zero-stress point is always characterized by the same cathode-current-Ar-pressure relationship.<>
Keywords :
niobium; sputtered coatings; stress effects; superconducting thin films; Ar; DC-magnetron-sputtered; Nb films; cathode voltages; cathode-current-Ar-pressure relationship; intrinsic mechanical stress; sputtering parameters; target erosion; zero-stress point; Argon; Cathodes; Compressive stress; Magnetic separation; Niobium; Sputtering; Stress measurement; Substrates; Superconducting films; Voltage;
Journal_Title :
Applied Superconductivity, IEEE Transactions on
