DocumentCode
1012766
Title
Intrinsic stress in DC sputtered niobium
Author
Booi, P.A.A. ; Livingston, C.A. ; Benz, S.P.
Author_Institution
Nat. Inst. of Stand. & Technol., Boulder, CO, USA
Volume
3
Issue
2
fYear
1993
fDate
6/1/1993 12:00:00 AM
Firstpage
3029
Lastpage
3031
Abstract
The intrinsic mechanical stress of DC-magnetron-sputtered Nb films is characterized as a function of sputtering parameters and target erosion. The zero-stress point shifts to lower cathode voltages as the target erodes. The zero-stress point is always characterized by the same cathode-current-Ar-pressure relationship.<>
Keywords
niobium; sputtered coatings; stress effects; superconducting thin films; Ar; DC-magnetron-sputtered; Nb films; cathode voltages; cathode-current-Ar-pressure relationship; intrinsic mechanical stress; sputtering parameters; target erosion; zero-stress point; Argon; Cathodes; Compressive stress; Magnetic separation; Niobium; Sputtering; Stress measurement; Substrates; Superconducting films; Voltage;
fLanguage
English
Journal_Title
Applied Superconductivity, IEEE Transactions on
Publisher
ieee
ISSN
1051-8223
Type
jour
DOI
10.1109/77.257236
Filename
257236
Link To Document