Title :
High-power AlGaN/GaN HFET with lower on-state resistance and higher switching time for an inverter circuit
Author :
Yoshida, S. ; Li, J. ; Wada, T. ; Takehara, H.
Author_Institution :
Yokohama R&D Labs., Furukawa Electr. Co. Ltd., Yokohama, Japan
fDate :
6/17/2004 12:00:00 AM
Abstract :
An AlGaN/GaN HFET with a much lower on-state resistance is described and used in an inverter circuit. It was confirmed that the AlGaN/GaN HFET could be operated at a current of over 20 A using gas-source molecular-beam epitaxy. The on-state resistance of the HFET was measured at 8 mΩ cm2 at 370 V. Switching times were investigated; the turn-on time was found to be 10 ns and the turn-off time 11 ns. The maximum operating frequency of the AlGaN/GaN HFET was 0.37 GHz. An inverter circuit was fabricated using AlGaN/GaN HFETs to convert DC 30 V to AC 100 V.
Keywords :
etching; insulated gate bipolar transistors; thyristors; 1.7 kV; 10 mus; MOS-gated thyristor; NPT technology; NPTV-groove clustered IGBT; TMAH chemical etching; V-groove CIGBT; V-groove trench gates; current saturation capability; fabrication costs; forward voltage; inductive circuit; short-circuit conditions; thyristor concept;
Journal_Title :
Circuits, Devices and Systems, IEE Proceedings -
DOI :
10.1049/ip-cds:20040458