Title :
High density interconnect EmbeddedMagnetics for integrated power
Author :
Roshen, W.A. ; Korman, C.S. ; Daum, W.
Author_Institution :
SSPower Technol., Hilliard, OH, USA
fDate :
7/1/2006 12:00:00 AM
Abstract :
We introduce here a new transformer/inductor technology which is suitable for integrated power for multichip modules (MCM), microprocessors and chip sets. The transformer/inductor is embedded within the ceramic substrate, as are the chips and other components. It provides for extremely tight secondary side circuit layouts with very low and fixed leakage inductance. The core is a new multipole structure which can be considered as a number of transformers integrated into one monolithic structure. The core consists of a bottom ferrite plate, and the winding is constructed using high density interconnect techniques (HDI), such as laminating dielectric layers and depositing winding metals using sputtering followed by electroplating. Winding patterns are etched using photo-resist and wet etching techniques. Multiple vias are used to connect different primary and secondary winding layers. A conformal metal mask is used to laser-drill through (large) holes for the posts of the top part of the core. An experimental 50-W, six-pole transformer has been built using these techniques. It operates at 1.0MHz with efficiency approaching 98.7% and has a net height of about 0.09in (∼2.3mm). It has a power density of 71W/cc (or 1170W/in3) and a surface power density of 17W/cm2.
Keywords :
ceramics; electroplating; leakage currents; microprocessor chips; multichip modules; sputtering; transformer cores; transformer windings; transformers; 0.09 in; 1.0 MHz; 50 W; 98.7 percent; MCM; ceramic substrate; chip sets; conformal metal mask; core; depositing winding metals; electroplating; embedded magnetics; ferrite plate; high density interconnect techniques; inductor; integrated power; laminating dielectric layers; leakage inductance; microprocessors; monolithic structure; multichip modules; multipole structure; photo-resist technique; primary winding; secondary winding; sputtering; transformer; wet etching technique; Ceramics; Ferrites; Inductance; Inductors; Integrated circuit interconnections; Integrated circuit technology; Microprocessors; Multichip modules; Transformer cores; Wet etching; High density interconnect (HDI); multichip modules (MCM);
Journal_Title :
Power Electronics, IEEE Transactions on
DOI :
10.1109/TPEL.2006.876893