DocumentCode :
1014671
Title :
Prediction of storage time in junction transistors
Author :
Nanavati, R.P.
Author_Institution :
Syracuse University, Syracuse, N.Y.
Volume :
7
Issue :
1
fYear :
1960
Firstpage :
9
Lastpage :
15
Abstract :
This paper points out that in the prediction of storage time one needs to know only a single fundamental device parameter, the storage time constant Ts. Several methods of measuring Ts, are considered and compared both theoretically and experimentally. A single nonoscilloscope method of measuring Tsis discussed and its theory presented. This method holds out the best promise for the ability to predict the storage time of very fast transistors. It is therefore now possible to predict large signal transient response of transistors on the basis of small signal nonoscilloscope measurements.
Keywords :
Charge carrier density; Chemical processes; Circuits; Impurities; Phonons; Semiconductor diodes; Semiconductor materials; Time measurement; Transient response; Tunneling; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IRE Transactions on
Publisher :
ieee
ISSN :
0096-2430
Type :
jour
DOI :
10.1109/T-ED.1960.14585
Filename :
1472692
Link To Document :
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