DocumentCode :
1016165
Title :
The effect of surface treatment on the electrical properties of metal contacts to boron-doped homoepitaxial diamond film
Author :
Grot, S.A. ; Gildenblat, Gennady Sh ; Hatfield, C.W. ; Wronski, C.R. ; Badzian, A.R. ; Badzian, T. ; Messier, Russell
Author_Institution :
Pennsylvania State Univ., University Park, PA, USA
Volume :
11
Issue :
2
fYear :
1990
Firstpage :
100
Lastpage :
102
Abstract :
Both doped and undoped homoepitaxial diamond films were fabricated using microwave plasma-enhanced chemical vapor deposition (CVD). The conductivity of the diamond film is strongly affected by the surface treatment. In particular, exposure of film surface to a hydrogen plasma results in the formation of a conductive layer which can be used to obtain linear (ohmic) I-V characteristics of the Au/diamond contacts, regardless of the doping level. It is shown how the proper chemical cleaning of the boron-doped homoepitaxial diamond surface allows the fabrication of Au-gate Schottky diodes with excellent rectifying characteristics at temperatures of at least 400 degrees C.<>
Keywords :
Schottky-barrier diodes; boron; diamond; gold; plasma CVD coatings; semiconductor epitaxial layers; surface treatment; 400 degC; Au-C:B; Schottky diodes; chemical cleaning; conductive layer; doping level; electrical properties; homoepitaxial films; hydrogen plasma; linear I-V characteristics; microwave plasma-enhanced chemical vapor deposition; rectifying characteristics; surface treatment; Chemical vapor deposition; Cleaning; Conductive films; Conductivity; Doping; Gold; Hydrogen; Plasma chemistry; Plasma properties; Surface treatment;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.46942
Filename :
46942
Link To Document :
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