• DocumentCode
    1016210
  • Title

    Epitaxial growth of germanium and silicon single crystal films from the vapor phase

  • Author

    Russell, G.

  • Author_Institution
    Motorola, Inc., Phoenix, Ariz.
  • Volume
    8
  • Issue
    2
  • fYear
    1961
  • fDate
    3/1/1961 12:00:00 AM
  • Firstpage
    175
  • Lastpage
    175
  • Keywords
    Bandwidth; Epitaxial growth; Filling; Germanium; Guns; Hydrogen; Magnetic fields; Masers; Semiconductor films; Silicon; Solid state circuits; Substrates; Temperature;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IRE Transactions on
  • Publisher
    ieee
  • ISSN
    0096-2430
  • Type

    jour

  • DOI
    10.1109/T-ED.1961.14739
  • Filename
    1472902