DocumentCode :
1016226
Title :
Vapor deposition of silicon
Author :
Sandler, N.P. ; Prussin, Simon A. ; Stevenson, Andrew
Author_Institution :
Pacific Semiconductors, Inc., Culver City, Calif.
Volume :
8
Issue :
2
fYear :
1961
fDate :
3/1/1961 12:00:00 AM
Firstpage :
175
Lastpage :
175
Keywords :
Chemical vapor deposition; Cities and towns; Epitaxial growth; Etching; Filling; Gain; Guns; Hydrogen; Magnetic fields; Masers; Shape; Silicon; Solid state circuits; Substrates; Temperature;
fLanguage :
English
Journal_Title :
Electron Devices, IRE Transactions on
Publisher :
ieee
ISSN :
0096-2430
Type :
jour
DOI :
10.1109/T-ED.1961.14740
Filename :
1472903
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1016226
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