DocumentCode
1016443
Title
Circuit Simulation of Threshold-Voltage Degradation in a-Si:H TFTs Fabricated at 175 °C
Author
Shringarpure, Rahul ; Venugopal, Sameer ; Li, Zi ; Clark, Lawrence T. ; Allee, David R. ; Bawolek, Edward ; Toy, Daniel
Author_Institution
Arizona State Univ., Tempe
Volume
54
Issue
7
fYear
2007
fDate
7/1/2007 12:00:00 AM
Firstpage
1781
Lastpage
1783
Abstract
This brief presents a novel approach to modeling gate bias-induced threshold-voltage (Vth) degradation in hydrogenated amorphous silicon thin-film transistors (TFTs). The Vth degradation model is added to the SPICE 3.0 TFT device model to obtain a composite model and is verified by comparing the simulated Vth shift with measured data in a TFT latch circuit.
Keywords
circuit simulation; silicon; thin film transistors; Si; circuit simulation; display technology; gate bias; hydrogenated amorphous silicon thin-film transistors; latch circuit; temperature 175 C; threshold-voltage degradation; Amorphous silicon; Circuit simulation; Degradation; Displays; Latches; Physics; SPICE; Stress; Temperature; Thin film transistors; Circuit simulation; SPICE; display technology; hydrogenated amorphous silicon thin-film transistor (a-Si:H TFT); threshold-voltage degradation;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2007.899667
Filename
4252383
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