Preparation and magnetic properties of Co-Cr films by toroidal plasma (TP) type sputtering

Author

Takahashi, Takakazu ; Naoe, Masahiko

Author_Institution

Dept. of Electr. Eng., Toyama Univ., Japan

Volume

25

Issue

5

fYear

1989

fDate

9/1/1989 12:00:00 AM

Firstpage

4174

Lastpage

4176

Abstract

A sputtering apparatus which can form a stable toroidal plasma has been developed in order to deposit magnetic films with a homogeneous and dense structure and excellent properties under the conditions of low argon gas pressure, low applied voltage, and low substrate temperature of around 30°C. All Co-Cr films deposited by this apparatus were composed of HCP (hexagonal-close-packed) crystallites with c-axis orientation ranging from 8° to 13°. The saturation magnetization varied from 380 to 780 emu/cc, and perpendicular coercivity varied from 100 to 30 Oe. D₅₀ of CoCr/Ni-Fe double layer floppy disks was as high as 50 kBPI

Keywords

chromium alloys; cobalt alloys; floppy discs; magnetic recording; magnetic thin films; sputtered coatings; 30 C; CoCr films; CoCr-NiFe double layer films; HCP crystallites; c-axis orientation; dense structure; floppy disks; low applied voltage; low substrate temperature; magnetic properties; perpendicular coercivity; perpendicular recording; preparation; saturation magnetization; sputtering apparatus; stable toroidal plasma; toroidal plasma sputtering; Argon; Crystallization; Low voltage; Magnetic films; Magnetic properties; Plasma density; Plasma properties; Plasma stability; Plasma temperature; Sputtering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.42559

Filename

42559