DocumentCode :
1017291
Title :
Discharge mechanisms in floating-gate e.p.r.o.m. cells
Author :
Davis, J.R.
Author_Institution :
Post Office Research Centre, Ipswich, UK
Volume :
15
Issue :
1
fYear :
1979
Firstpage :
20
Lastpage :
21
Abstract :
Measurements of charge loss from floating-gate e.p.r.o.m. cells have been made at low temperatures by applying terminal voltages to accelerate the discharge. The results strongly suggest that the operative mechanism is electronic tunnelling, implying that it is not possible to make a simple Arrhenius extrapolation from high-temperature storage experiments to service conditions.
Keywords :
field effect integrated circuits; integrated memory circuits; read-only storage; discharge mechanisms; electronic tunnelling; floating gate EPROM cells; low temperature discharge rate measurements;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19790015
Filename :
4255978
Link To Document :
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