• DocumentCode
    1017341
  • Title

    Impurity induced pipes through diffused layers

  • Author

    Goetzberger, A.

  • Author_Institution
    Stanford Industrial Park, Palo Alto, Calif.
  • Volume
    8
  • Issue
    5
  • fYear
    1961
  • Firstpage
    429
  • Lastpage
    430
  • Keywords
    Alloying; Boron; Conducting materials; Dielectric substrates; Doping; Grain boundaries; Impurities; Oxidation; Semiconductor diodes; Semiconductor process modeling; Shape; Silicon; Solid state circuits; Surface contamination; Temperature; Thermal conductivity;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IRE Transactions on
  • Publisher
    ieee
  • ISSN
    0096-2430
  • Type

    jour

  • DOI
    10.1109/T-ED.1961.14851
  • Filename
    1473014