DocumentCode :
1017342
Title :
Mobility, transit time and transconductance in submicrometre-gate-length m.e.s.f.e.t.s
Author :
Frey, Jeffrey ; Wada, Tomotaka
Author_Institution :
Cornell University, School of Electrical Engineering, Ithaca, USA
Volume :
15
Issue :
1
fYear :
1979
Firstpage :
26
Lastpage :
28
Abstract :
Two-dimensional simulations of submicrometre-gate-length m.e.s.f.e.t.s of Si, GaAs and InP show that device transit time and transconductance depend more on high-field diffusion constant and the shape of the velocity/field characteristic than on low-field mobility. Reasonable InP devices have shorter transit times and higher transconductances than GaAs devices, and for certain device parameters these figures of merit can be almost the same for Si and GaAs devices.
Keywords :
III-V semiconductors; Schottky gate field effect transistors; digital simulation; electronic engineering computing; elemental semiconductors; gallium arsenide; indium compounds; semiconductor device models; silicon; solid-state microwave devices; GaAs; InP; Si; carrier mobility; sub micron gate length MESFETs; transconductance; transit time; two dimensional simulation;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19790020
Filename :
4255983
Link To Document :
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