• DocumentCode
    1017361
  • Title

    Diffused three-layer structures along small-angle grain boundaries in silicon

  • Author

    Queisser, H.J.

  • Author_Institution
    Shockley Transistor, Palo Alto, Calif.
  • Volume
    8
  • Issue
    5
  • fYear
    1961
  • Firstpage
    429
  • Lastpage
    429
  • Keywords
    Boron; Conducting materials; Contracts; Doping; Grain boundaries; Impurities; Oxidation; Passivation; Plastics; Seals; Semiconductor process modeling; Shape; Silicon; Solid state circuits; Surface contamination; Thermal conductivity;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IRE Transactions on
  • Publisher
    ieee
  • ISSN
    0096-2430
  • Type

    jour

  • DOI
    10.1109/T-ED.1961.14853
  • Filename
    1473016