The growth and superhydrophobicity of a perfluorocarbon nanoneedle array on an SiO/sub 2/ surface

Author

Tang, Yanjun ; Xu, Xiaohe ; Fang, Ji ; Liang, Yu ; Ji, Hai-Feng

Author_Institution

Dept. of Mech. & Ind. Eng., Illinois Univ., Urbana, IL

Volume

5

Issue

4

fYear

2006

fDate

7/1/2006 12:00:00 AM

Firstpage

415

Lastpage

419

Abstract

Alternate employment of etching gas (SF₆) and deposition gas (C₄F₈) on an unpolished SiO₂ surface in an inductive coupling plasma system generates a perfluorocarbon nanoneedle array at low pressure and at ambient temperature. The nanoneedle averages 300 nm in diameter and the nanoneedle surface has a large water contact angle of 171deg. The superhydrophobicity of the perfluorocarbon nanoneedle surface may be used in many industrial and biological processes

Keywords

contact angle; nanostructured materials; organic compounds; plasma deposition; silicon compounds; sputter etching; C₄F₈ deposition gas; SF₆ etching gas; SiO₂; inductive coupling plasma system; perfluorocarbon nanoneedle array; superhydrophobicity; unpolished surface; water contact angle; Etching; Magnetic materials; Nanobioscience; Nanostructured materials; Nanostructures; Plasma applications; Plasma materials processing; Plasma temperature; Polymers; Silicon; Inductive coupling plasma (ICP); nanoneedle; perfluorocarbon; superhydrophobic; ultrahydrophobic;

fLanguage

English

Journal_Title

Nanotechnology, IEEE Transactions on

Publisher

ieee

ISSN

1536-125X

Type

jour

DOI

10.1109/TNANO.2006.877018

Filename

1652860