Title :
The growth and superhydrophobicity of a perfluorocarbon nanoneedle array on an SiO/sub 2/ surface
Author :
Tang, Yanjun ; Xu, Xiaohe ; Fang, Ji ; Liang, Yu ; Ji, Hai-Feng
Author_Institution :
Dept. of Mech. & Ind. Eng., Illinois Univ., Urbana, IL
fDate :
7/1/2006 12:00:00 AM
Abstract :
Alternate employment of etching gas (SF6) and deposition gas (C4F8) on an unpolished SiO2 surface in an inductive coupling plasma system generates a perfluorocarbon nanoneedle array at low pressure and at ambient temperature. The nanoneedle averages 300 nm in diameter and the nanoneedle surface has a large water contact angle of 171deg. The superhydrophobicity of the perfluorocarbon nanoneedle surface may be used in many industrial and biological processes
Keywords :
contact angle; nanostructured materials; organic compounds; plasma deposition; silicon compounds; sputter etching; C4F8 deposition gas; SF6 etching gas; SiO2; inductive coupling plasma system; perfluorocarbon nanoneedle array; superhydrophobicity; unpolished surface; water contact angle; Etching; Magnetic materials; Nanobioscience; Nanostructured materials; Nanostructures; Plasma applications; Plasma materials processing; Plasma temperature; Polymers; Silicon; Inductive coupling plasma (ICP); nanoneedle; perfluorocarbon; superhydrophobic; ultrahydrophobic;
Journal_Title :
Nanotechnology, IEEE Transactions on
DOI :
10.1109/TNANO.2006.877018
