Title :
Very low OH content P2O5-doped silica fibres
Author :
Ohmori, Yasuji ; Okazaki, Hisaaki ; Hatakeyama, Iwao ; Takata, Hisao
Author_Institution :
NTT Ibaraki Electrical Communication Laboratory, Tokai, Japan
Abstract :
Very low OH content optical fibres consisting of P2O5-doped silica core and GeO2-P2O5-B2O3-doped silica cladding were fabricated by the m.c.v.d. technique. The relation between the OH absorption loss and the deposition temperature was clarified. The OH content in this fibre could be reduced to about seven parts per billion (~ 7 × 10¿9) by using a low deposition temperature.
Keywords :
chemical vapour deposition; optical fibres; CVD; GeO2-P2O5-B2O3 doped silica cladding; OH ion absorption loss; P2O5 doped silica core; deposition temperature; silica optical fibres;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19790440
