• DocumentCode
    1018058
  • Title

    Disturbance of a Langmuir probe at the steady-State sheath boundary in a drifting plasma

  • Author

    Kwok, Dixon T.K. ; Bilek, M.M.M. ; McKenzie, D.R. ; Oates, T.W.H. ; Chu, Paul K.

  • Author_Institution
    Sch. of Phys., Univ. of Sydney, NSW, Australia
  • Volume
    32
  • Issue
    2
  • fYear
    2004
  • fDate
    4/1/2004 12:00:00 AM
  • Firstpage
    422
  • Lastpage
    428
  • Abstract
    The disturbance resulting from the presence of a positively biased Langmuir probe at an equilibrium steady-state ion sheath boundary in the drifting plasma is simulated by the two-dimensional particle-in-cell (PIC) method in rectangular coordinates. The positive potential of the probe was found to shield electrons on the side of the probe away from the sample surface from the negative potential of the sample surface and thereby cause an increase in the electron current drawn by the probe. The drifting ions on the same side of the probe are slowed by it and thereby raising the ion density in front of the probe. The electron currents of the probe are calculated at different probe positions from the sample surface. It is found that the sheath boundary as defined by the probe current is wider than the unperturbed boundary. The widening of the sheath boundary agrees well with experimental sheath boundary measurements.
  • Keywords
    Langmuir probes; ion density; plasma boundary layers; plasma density; plasma immersion ion implantation; plasma sheaths; plasma simulation; plasma transport processes; Langmuir probe disturbance; drifting ions; drifting plasma; electron current; ion density; plasma measurements; rectangular coordinates; steady-state ion sheath boundary; two-dimensional particle-in-cell method; Electrons; Plasma applications; Plasma density; Plasma immersion ion implantation; Plasma measurements; Plasma sheaths; Plasma simulation; Probes; Steady-state; Voltage; Child–Langmuir law; Langmuir probe; PIC; particle-in-cell; plasma measurements; plasma sheaths; simulation;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2004.826027
  • Filename
    1308487