DocumentCode
1018496
Title
Minority carrier injection characteristics of the diffused emitter junction
Author
Kennedy, D.P. ; Murley, P.C.
Author_Institution
IBM Corporation, Poughkeepsie, N. Y.
Volume
9
Issue
2
fYear
1962
fDate
3/1/1962 12:00:00 AM
Firstpage
136
Lastpage
142
Abstract
For the double-diffused transistor, a one-dimensional analysis is presented on the minority carrier injection properties of a diffused emitter junction. This junction is bounded on one side by a reverse biased collector and on the other by an ohmic contact of arbitrary recombination velocity. Furthermore, arbitrary magnitudes of minority carrier lifetime are assumed in both the emitter and base regions of this semiconductor device. Injection efficiency characteristics are graphically illustrated throughout a wide range of physical and geometrical parameters. Assuming, for example, variations in the emitter junction depth, injection properties are demonstrated for transistors exhibiting a fixed collector location and also for transistors exhibiting a fixed base width. A comparison is also shown between the calculated minority carrier injection from this analysis and from other, more approximate, methods.
Keywords
Atomic layer deposition; Charge carrier lifetime; Electrical resistance measurement; Electron devices; Equations; Geometry; Impurities; Information analysis; Ohmic contacts; P-n junctions; Radiative recombination; Semiconductor devices; Space charge;
fLanguage
English
Journal_Title
Electron Devices, IRE Transactions on
Publisher
ieee
ISSN
0096-2430
Type
jour
DOI
10.1109/T-ED.1962.14961
Filename
1473189
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