• DocumentCode
    1018496
  • Title

    Minority carrier injection characteristics of the diffused emitter junction

  • Author

    Kennedy, D.P. ; Murley, P.C.

  • Author_Institution
    IBM Corporation, Poughkeepsie, N. Y.
  • Volume
    9
  • Issue
    2
  • fYear
    1962
  • fDate
    3/1/1962 12:00:00 AM
  • Firstpage
    136
  • Lastpage
    142
  • Abstract
    For the double-diffused transistor, a one-dimensional analysis is presented on the minority carrier injection properties of a diffused emitter junction. This junction is bounded on one side by a reverse biased collector and on the other by an ohmic contact of arbitrary recombination velocity. Furthermore, arbitrary magnitudes of minority carrier lifetime are assumed in both the emitter and base regions of this semiconductor device. Injection efficiency characteristics are graphically illustrated throughout a wide range of physical and geometrical parameters. Assuming, for example, variations in the emitter junction depth, injection properties are demonstrated for transistors exhibiting a fixed collector location and also for transistors exhibiting a fixed base width. A comparison is also shown between the calculated minority carrier injection from this analysis and from other, more approximate, methods.
  • Keywords
    Atomic layer deposition; Charge carrier lifetime; Electrical resistance measurement; Electron devices; Equations; Geometry; Impurities; Information analysis; Ohmic contacts; P-n junctions; Radiative recombination; Semiconductor devices; Space charge;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IRE Transactions on
  • Publisher
    ieee
  • ISSN
    0096-2430
  • Type

    jour

  • DOI
    10.1109/T-ED.1962.14961
  • Filename
    1473189