DocumentCode :
1020432
Title :
Reduction of floating substrate effect in thin-film SOI MOSFETs
Author :
Colinge, J.-P.
Author_Institution :
Hewlett-Packard Laboratories, Palo Alto, USA
Volume :
22
Issue :
4
fYear :
1986
Firstpage :
187
Lastpage :
188
Abstract :
The presence of a floating substrate in SOI transistors gives rise to a decrease of threshold voltage when drain voltage is increased. When the devices are made in a very thin silicon film, the latter is completely depleted when the device is in the ´on´ state, and no part of the film can act as a floating substrate. This brings about a dramatic decrease of the so-called ´kink effect´.
Keywords :
insulated gate field effect transistors; thin film transistors; MOSFETs; SOI transistors; floating substrate effect; kink effect; thin film type; threshold voltage;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19860130
Filename :
4256317
Link To Document :
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