DocumentCode :
1022003
Title :
Influences of sputtering gas pressure on microtexture and crystallographic characteristics of Ba-ferrite thin films for high density recording media
Author :
Morisako, A. ; Matsumoto, M. ; Naoe, M.
Author_Institution :
Shinshu University, Nagano, Japan
Volume :
23
Issue :
1
fYear :
1987
fDate :
1/1/1987 12:00:00 AM
Firstpage :
56
Lastpage :
58
Abstract :
Ba-ferrite films with small c-axis dispersion angle Δθ50are suitable for ultrahigh density recording media. The dependences of partial oxygen gas pressure PO2and total discharge gas pressure PTotalon the characteristics of Ba-ferrite films were clarified. It was found that there were three regions, where films were composed of single layer of spinel type ferrite(PO2≤0.002mTorr), mixed layer of spinel and magnetoplumbite type ferrites ( 0.003 \\leq P_{O2} \\leq 0.2 mTorr) and single layer of magnetoplumbite type ferrite (PO2>0.3 mTorr). In the range of P02between 0.005 and 0.2 mTorr, spinel-like ferrite layer plays very important role as an underlayer to decrease the Δθ50of the Ba-ferrite layer. Films deposited at relatively low PO2and PTotalexhibit very smooth surface and Δθ50as small as 2.5\\sim3.5\\deg .
Keywords :
Perpendicular magnetic recording; Sputtering; Crystallography; Ferrite films; Magnetic films; Magnetization; Perpendicular magnetic recording; Sputtering; Substrates; Surface discharges; Temperature measurement; X-ray diffraction;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1987.1064821
Filename :
1064821
Link To Document :
بازگشت