DocumentCode :
1022275
Title :
Comparison between magneto-optic and VSM measurements of bias-sputtered CoCr films with perpendicular anisotropy
Author :
Mapps, D.J. ; Mahvan, N. ; Akhter, M.A.
Author_Institution :
Dept. of Electr. & Electron. Eng., Plymouth Polytech., UK
Volume :
25
Issue :
5
fYear :
1989
fDate :
9/1/1989 12:00:00 AM
Firstpage :
4192
Lastpage :
4194
Abstract :
A direct comparison between surface and bulk hysteresis behavior is made on a variety of bias-sputtered CoCr films using magnetooptic and VSM (vibrating sample magnetometer) techniques. The results show that bias sputtering at around -100 V leads to an improvement in the surface as well as the volume magnetic properties of CoCr films. Furthermore, a reversal in the magnitude of surface and volume coercivities is observed when the Cr content of the films exceeds 13 at.% and the film thickness increases above 0.4 μm. These effects are attributed to the presence of pores on the film surface which affect the demagnetizing factor of the surface with respect to the volume. The magnetooptical rotation signal obtained from the surface and the back of the films is used to assess their respective saturation magnetization and, hence, the extent of Cr solubility or segregation at the two boundaries
Keywords :
chromium alloys; cobalt alloys; coercive force; magnetic recording; magnetic thin films; magnetic variables measurement; sputtered coatings; -100 V; 0.4 micron; Cr content; Cr solubility; VSM measurements; bias sputtered CoCr films; bias sputtering; bulk hysteresis behavior; demagnetizing factor; film thickness; magnetooptical measurements; magnetooptical rotation signal; perpendicular anisotropy; pores; saturation magnetization; surface coercivities; surface hysteresis behavior; surface magnetic properties; vibrating sample magnetometer; volume coercivities; volume magnetic properties; Chromium; Coercive force; Demagnetization; Magnetic films; Magnetic hysteresis; Magnetic properties; Magnetometers; Magnetooptic effects; Saturation magnetization; Sputtering;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.42565
Filename :
42565
Link To Document :
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