• DocumentCode
    1022379
  • Title

    High-power and high-efficiency phased array lasers grown by a two-step metalorganic chemical vapour deposition

  • Author

    Welch, D.F. ; Cross, P.S. ; Scifres, D.R. ; Harnagel, G. ; Cardinal, M. ; Streifer, W. ; Burnham, R.D.

  • Author_Institution
    Spectra Diode Laboratories, San Jose, USA
  • Volume
    22
  • Issue
    9
  • fYear
    1986
  • Firstpage
    464
  • Lastpage
    466
  • Abstract
    Phased array lasers which emit 1.3 W CW output were fabricated using a two-step metalorganic chemical vapour deposition process were developed. The differential efliciency at 100 mW is 78% and the total efficiency at the catastrophic limit is 39%.
  • Keywords
    III-V semiconductors; aluminium compounds; chemical vapour deposition; gallium arsenide; semiconductor junction lasers; 1.3 W CW output; GaAs/GaAlAs lasers; MOCVD; catastrophic limit; differential efficiency; efficiency; high power phased array lasers; high-efficiency; semiconductors; two-step metalorganic chemical vapour deposition;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19860316
  • Filename
    4256510