DocumentCode :
1022858
Title :
Implications of Dopant-Fluctuation-Induced V_{\\rm t} Variations on the Radiation Hardness of Deep Submicrometer CMOS SRAMs
Author :
Balasubramanian, Anupama ; Fleming, Patrick R. ; Bhuva, Bharat L. ; Sternberg, Andrew L. ; Massengill, Lloyd W.
Author_Institution :
Vanderbilt Univ., Nashville
Volume :
8
Issue :
1
fYear :
2008
fDate :
3/1/2008 12:00:00 AM
Firstpage :
135
Lastpage :
144
Abstract :
Accurately analyzing the single-event (SE) vulnerability of static random-access memory (SRAM) cells leads to precisely calculated soft-error rates (SERs). Random dopant-fluctuation-induced Vt variations affect the SE vulnerability of these memory cells and increase the intercell spread in critical charge (Qcrit), which cause SE upsets. This might consequently lead to higher SERs than would be calculated, assuming a single critical charge. Monte Carlo simulations in the IBM 130- and 90-nm technologies quantify this spread in Qcrit and in SRAM soft-error cross sections with increasing variance. For a radiation-tolerant design, a statistical-design methodology must be used to validate existing hardening schemes and to obtain the expected tolerance levels.
Keywords :
CMOS logic circuits; Monte Carlo methods; SRAM chips; radiation hardening (electronics); Monte Carlo simulations; deep submicrometer CMOS SRAM; dopant-fluctuation-induced variations; radiation hardness; single-event vulnerability; soft-error rates; static random-access memory cells; $V_{rm t}$ variations; Critical charge $(Q_{rm crit})$; SE upset (SEU); Single Event Upset (SEU); Single Events (SE); Vt variations; critical charge (Qcrit); deep sub-micron; deep submicrometer; random dopant fluctuations (RDF); random dopant fluctuations (RDFs); single events (SEs); soft error rate (SER); soft-error rate (SER); static random access memory (SRAM) cell; static random-access memory (SRAM) cell;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2007.915011
Filename :
4414357
Link To Document :
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