DocumentCode
1022882
Title
DC-SQUIDs fabricated by electron beam direct writing
Author
Carelli, P. ; Foglietti, V. ; Leoni, R.
Author_Institution
Istituto di Elettronica della Stato Solido, C.N.R. Roma, Italy
Volume
23
Issue
2
fYear
1987
fDate
3/1/1987 12:00:00 AM
Firstpage
1087
Lastpage
1089
Abstract
An Electron Beam MicroFabricator (EBMF) has been used to write directly on a silicon wafer to obtain many equal chips containing dc-SQUIDs and superconducting test circuitry. We developed a complete lift-off technique on an electronic resist for all the seven needed layers of the process. The first layer, consisting of Au-Pd alloy, is used as resistor and for patterning the markers required to align the various layers. The calibration on such markers avoid the stitching problem due to the large chip dimensions (6.30×6.30 mm) as compared with the maximum range of the electron beam deflection. The direct writing permits alignment between the various layers better than 1um in any chip. The first test on the developed devices shows high reliability and flexibility of the overall process.
Keywords
Electron radiation effects; Josephson devices; Biomedical optical imaging; Circuit testing; Electrodes; Electron beams; Optical noise; Resistors; Resists; SQUIDs; Silicon; Writing;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1987.1064900
Filename
1064900
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