Title :
High-speed ring oscillators using planar p+-gate n-AlGaAs/GaAs 2DEG FETs
Author :
Suzuki, Yuya ; Hida, Hirotaka ; Toyoshima, Hisashi ; Ohata, Katsuki
Author_Institution :
NEC Corporation, Microelectronics Research Laboratories, Kawasaki, Japan
Abstract :
An E/R DCFL ring oscillator has been fabricated using a planar n-AlGaAs/GaAs 2DEG enhancement FET with p+-gate structure. For 1 ¿m gate length E-FETs, the standard deviation of threshold voltage was as small as 17.6 mV at 0.016 V average threshold voltage. At room temperature, a gate propagation delay of 15 ps/gate at a 5.25 mW/gate power dissipation was obtained from a 25-stage ring oscillator. A small minimum power-delay product of 14 fJ/gate was attained at 0.65 V supply voltage.
Keywords :
III-V semiconductors; aluminium compounds; field effect integrated circuits; gallium arsenide; high electron mobility transistors; integrated logic circuits; oscillators; 2DEG FETs; 5.25 mW/gate power dissipation; DCFL ring oscillator; HEMT; III-V semiconductors; logic IC; n-AlGaAs/GaAs; p+-gate structure; two-dimensional electron gas device;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19860460