Title :
Josephson integrated circuit process for scientific applications
Author :
Sandstrom, R.L. ; Kleinsasser, A.W. ; Gallagher, W.J. ; Raider, S.I.
Author_Institution :
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
fDate :
3/1/1987 12:00:00 AM
Abstract :
We have developed and are regularly practicing a seven mask-level Josephson integrated circuit fabrication process tailored to dc SQUID requirements and intended for SQUID studies and other scientific applications of Josephson technology. The process incorporates low capacitance Nb/Nb2O5/PbAuIn edge junctions, PdAu shunt resistors, and a wiring pitch of 5 μm for the SQUID input coil level (which is PbAuIn). The junctions can be made as small as 2μm by 0.3μm, with a capacitance (including parasitics) of ∼0.14 pF. This process yields stable and reliable junctions and integrated circuits.
Keywords :
Josephson devices; Application specific integrated circuits; Coils; Fabrication; Integrated circuit technology; Integrated circuit yield; Niobium; Parasitic capacitance; Resistors; SQUIDs; Wiring;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1987.1065115