DocumentCode
1026510
Title
Iron films sputter-deposited by utilizing Ar gas flow
Author
Ishii, Kiyoshi ; Noda, Hitoshi
Author_Institution
Utsunomiya University, Utsunomiya-shi, Japan
Volume
23
Issue
5
fYear
1987
fDate
9/1/1987 12:00:00 AM
Firstpage
2734
Lastpage
2736
Abstract
A modified sputtering method allowed a considerable high rate deposition of Fe films and could also produce films which consisted of an assembly of small spherical shape particles. In this sputtering, Fe atoms sputtered in the inside of a hollow type of Fe target were pushed out by flowing Ar gas and deposited on the substrate placed in front of the target. This mechanism enabled sputter-deposition of films in high pressure Ar atmosphere. The films consisted of particles with hard magnetic properties, By changing substrate temperature, the coercive force of 1000 Å- 3000 Å thick films could be controlled up to a maximum of 650 Oe.
Keywords
Magnetic films/devices; Noble gases; Sputtering; Argon; Assembly; Atmosphere; Atomic layer deposition; Fluid flow; Iron; Magnetic films; Magnetic properties; Shape; Sputtering;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1987.1065232
Filename
1065232
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