• DocumentCode
    1026959
  • Title

    Room temperature continuous wave operation of 671 nm wavelength GaInAsP/AlGaAs VSIS lasers

  • Author

    Chong, Te-Ho ; Kishino, Katsumi

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Sophia Univ., Tokyo, Japan
  • Volume
    2
  • Issue
    2
  • fYear
    1990
  • Firstpage
    91
  • Lastpage
    93
  • Abstract
    Room-temperature continuous-wave (CW) operation of a liquid-phase epitaxy (LPE)-grown GaInAsP/AlGaAs laser that uses a V-channel substrate inner stripe (VSIS) structure to obtain current confinement and transverse mode control is discussed. The threshold current and lasing wavelength were 77 mA and 671 nm, respectively, and the temperature dependence of the threshold current was such that the characteristic temperature was 75 K.<>
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; gallium compounds; indium compounds; liquid phase epitaxial growth; semiconductor growth; semiconductor junction lasers; 293 K; 671 nm; 75 K; 77 mA; V-channel substrate inner stripe structure; characteristic temperature; current confinement; lasing wavelength; liquid phase epitaxy grown GaInAsP-AlGaAs laser; room temperature continuous wave operation; temperature dependence; threshold current; transverse mode control; Fiber lasers; Gallium arsenide; Laser modes; MOCVD; Optical control; Optical device fabrication; Semiconductor lasers; Substrates; Temperature dependence; Threshold current;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/68.47057
  • Filename
    47057