• DocumentCode
    1027100
  • Title

    Study of the dynamic resistance of amorphous alloys during the structural relaxation processes

  • Author

    Jiang, En-Yong ; Lu, Qi ; Li, Jian-Ling

  • Author_Institution
    University of Tianjin, Tianjin, P.R. China
  • Volume
    23
  • Issue
    5
  • fYear
    1987
  • fDate
    9/1/1987 12:00:00 AM
  • Firstpage
    2144
  • Lastpage
    2145
  • Abstract
    The effects of the annealing treatment on the temperature coefficient of electrical resistivity of amorphous Fe80.5W5B14.5and Fe41Ni39P12B8alloys have been investigated by means of the d.c. four-probe method. The experimental results indicate that the temperature coefficients of electrical resistivity of the specimens increase after the annealing treatment. We have analysed the characteristics of electronic transport of the amorphous alloys in the structural relaxation process and have observed that annealing treatment increases the temperature coefficient of resistivity of the amorphous alloys.
  • Keywords
    Amorphous magnetic materials/devices; Relaxation processes; Amorphous materials; Amorphous semiconductors; Annealing; Chemical analysis; Conductivity; Electric resistance; Fluctuations; Physics; Resource description framework; Temperature distribution;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1987.1065286
  • Filename
    1065286
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1027100