DocumentCode
1027752
Title
Measurement of high-field carrier drift velocities in silicon by a time-of-flight technique
Author
Norris, C.B., Jr. ; Gibbons, J.F.
Author_Institution
Stanford University, Stanford, Calif.
Volume
14
Issue
1
fYear
1967
fDate
1/1/1967 12:00:00 AM
Firstpage
38
Lastpage
43
Abstract
In this paper we describe a time-of-flight technique which has been used to measure the drift velocities of carriers in silicon at high electric fields. Carrier velocities are determined absolutely by measuring the transit time of carriers through a region of approximately uniform electric field and known width in a p+-ν -n+diode. The transit time is obtained directly as the duration of the sample current pulse following bombardment of one face of the p+-ν-n+diode with a very short pulse of 10-keV electrons. The ratio of the known sample width to the measured transit time gives the carrier velocity for a particular value of electric field. The carrier-velocity data thus obtained are absolute, with an accuracy of approximately ± 5 percent. Drift-velocity data for carriers in silicon are presented for electric fields between 4 and 40 kV/cm and the present data are compared with those obtained from measurements of current density in bulk samples as a function of electric field.
Keywords
Current density; Current measurement; Density measurement; Diodes; Electric variables measurement; Electron mobility; Particle measurements; Silicon; Time measurement; Velocity measurement;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1967.15893
Filename
1474616
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