DocumentCode :
1027841
Title :
Analysis of double-gate thin-film transistor
Author :
Farrah, H.R. ; Steinberg, R.F.
Author_Institution :
Bendix Corporation, Southfield, Mich.
Volume :
14
Issue :
2
fYear :
1967
fDate :
2/1/1967 12:00:00 AM
Firstpage :
69
Lastpage :
74
Abstract :
An analysis is made of a double-gate thin-film transistor structure, and equations are derived for current flow for different input conditions on each gate. The use of two independent gates allows the possibility of simultaneously maintaining depletion and enhancement regions along the channel, and Poisson\´s equation is used to find the field and potential distribution along the channel. It is shown that by proper manipulation of the second gate, characteristic curves ranging from the normal TFT "pentode" curves to "triode" curves can be obtained from the same device. A comparison is given of experimental and theoretical results.
Keywords :
Conducting materials; Conductivity; Dielectrics; Insulation; P-n junctions; Poisson equations; Semiconductor materials; Semiconductor thin films; Thin film transistors; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1967.15901
Filename :
1474624
Link To Document :
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