DocumentCode
1028513
Title
Stability properties of indium doped TbFe amorphous films for magneto-optic memory applications
Author
Iijima, Tetsuo ; Hatakeyama, Iwao
Author_Institution
NTT Electrical Communication Laboratories, Ibaraki, Japan
Volume
23
Issue
5
fYear
1987
fDate
9/1/1987 12:00:00 AM
Firstpage
2626
Lastpage
2628
Abstract
The stability of Indium doped TbFe amorphous films is investigated. These TbFeIn films show strong resistance to oxygen diffusion. The indium is considered to act on a thin surface layer of Tb and Fe oxides, making it a passive oxide layer. Gradual increase of saturation magnetization with aging can be explained by preferential Tb oxidation caused by oxygen diffusion increases near the film surface. An oxygen diffusion coefficient of 5 × 10-23m2/sec is obtained for the TbFeIn films after 2,000 hours aging at 70°C and 85 % R.H. This value is lower by at least a factor of hundred as compared to TbFe films.
Keywords
Indium materials/devices; Magnetooptic memories; Aging; Amorphous materials; Corrosion; Indium; Magnetic field measurement; Magnetic properties; Optical films; Optical saturation; Oxidation; Stability;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1987.1065409
Filename
1065409
Link To Document