DocumentCode

1029902

Title

Thermal oxidation of silicon as an impurity-controlled process

Author

Evans, Robin J.

Volume

14

Issue

11

fYear

1967

fDate

11/1/1967 12:00:00 AM

Firstpage

789

Lastpage

790

Keywords

Chemicals; Heat treatment; Kinetic theory; Least squares methods; Mechanical factors; Oxidation; Process control; Silicon; Temperature; Water;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/T-ED.1967.16110

Filename

1474833