Title :
Thermal oxidation of silicon as an impurity-controlled process
fDate :
11/1/1967 12:00:00 AM
Keywords :
Chemicals; Heat treatment; Kinetic theory; Least squares methods; Mechanical factors; Oxidation; Process control; Silicon; Temperature; Water;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1967.16110
