Dependence of segregated microstructure in sputter-deposited CoCr film on deposition conditions

The compositional segregation of sputter-deposited CoCr films prepared under substrate temperatures Ts of 90-160°C and Ar gas pressures PAr of 4-30 mTorr are studied by transmission electron microscopy. The segregated microstructure depends on Ts and PAr. The degree of the segregation increases as Ts increases, and is maximized at a medium PAr. Saturation magnetization increases as the degree of the segregation increases. Vertical coercivity in film with the same degree of the c-axis orientation increases as the degree of segregation increases.