DocumentCode :
1031639
Title :
Heterostructure complementary technology
Author :
Simmons, Jay G. ; Taylor, Graham W.
Author_Institution :
University of Bradford, Microelectronics & CADMAT Centre, Bradford, UK
Volume :
23
Issue :
8
fYear :
1987
Firstpage :
380
Lastpage :
382
Abstract :
A complementary inverter configuration based on two new heterostructure field-effect devices is proposed. The FETs are fabricated in a common substrate grown by molecular-beam epitaxy. The devices rely on the formation of inversion layers at heterojunction interfaces.
Keywords :
field effect integrated circuits; high electron mobility transistors; invertors; junction gate field effect transistors; GaAs-AlGaAs; complementary inverter configuration; heterojunction interfaces; heterostructure FET; heterostructure JFET; heterostructure field-effect devices; inversion layers; molecular-beam epitaxy;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19870278
Filename :
4257607
Link To Document :
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