DocumentCode :
1031746
Title :
Effect of rare gas implantation on the magnetic properties of amorphous CoTi thin films
Author :
Suran, G. ; Gerard, P.
Author_Institution :
CNRS Meudon-Bellevue, France
Volume :
23
Issue :
5
fYear :
1987
fDate :
9/1/1987 12:00:00 AM
Firstpage :
2740
Lastpage :
2742
Abstract :
We report here on the effect of Xe+ ion irradiation on the magnetic properties of amorphous CoTi thin films. With increasing fluence range the in-plane Kuor perpendicuIar anisotropy Kpdecreases continuously and disappears for 5×1015Xe+/cm2, while the magnetization remains unchanged. Resonance measurements shows that even for low fluences the homogeneity along the film thickness is improved. In comparison with thermal annealing the much higher efficiency of ion irradiation in order to suppress Kuis displayed. Discussions on the physical origin of Kuare also given.
Keywords :
Amorphous magnetic films/devices; Ion implantation; Noble gases; Amorphous magnetic materials; Amorphous materials; Anisotropic magnetoresistance; Annealing; Magnetic films; Magnetic properties; Magnetic resonance; Substrates; Thickness measurement; Transistors;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1987.1065710
Filename :
1065710
Link To Document :
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