DocumentCode
1031746
Title
Effect of rare gas implantation on the magnetic properties of amorphous CoTi thin films
Author
Suran, G. ; Gerard, P.
Author_Institution
CNRS Meudon-Bellevue, France
Volume
23
Issue
5
fYear
1987
fDate
9/1/1987 12:00:00 AM
Firstpage
2740
Lastpage
2742
Abstract
We report here on the effect of Xe+ ion irradiation on the magnetic properties of amorphous CoTi thin films. With increasing fluence range the in-plane Ku or perpendicuIar anisotropy Kp decreases continuously and disappears for 5×1015Xe+/cm2, while the magnetization remains unchanged. Resonance measurements shows that even for low fluences the homogeneity along the film thickness is improved. In comparison with thermal annealing the much higher efficiency of ion irradiation in order to suppress Ku is displayed. Discussions on the physical origin of Ku are also given.
Keywords
Amorphous magnetic films/devices; Ion implantation; Noble gases; Amorphous magnetic materials; Amorphous materials; Anisotropic magnetoresistance; Annealing; Magnetic films; Magnetic properties; Magnetic resonance; Substrates; Thickness measurement; Transistors;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1987.1065710
Filename
1065710
Link To Document