• DocumentCode
    1031746
  • Title

    Effect of rare gas implantation on the magnetic properties of amorphous CoTi thin films

  • Author

    Suran, G. ; Gerard, P.

  • Author_Institution
    CNRS Meudon-Bellevue, France
  • Volume
    23
  • Issue
    5
  • fYear
    1987
  • fDate
    9/1/1987 12:00:00 AM
  • Firstpage
    2740
  • Lastpage
    2742
  • Abstract
    We report here on the effect of Xe+ ion irradiation on the magnetic properties of amorphous CoTi thin films. With increasing fluence range the in-plane Kuor perpendicuIar anisotropy Kpdecreases continuously and disappears for 5×1015Xe+/cm2, while the magnetization remains unchanged. Resonance measurements shows that even for low fluences the homogeneity along the film thickness is improved. In comparison with thermal annealing the much higher efficiency of ion irradiation in order to suppress Kuis displayed. Discussions on the physical origin of Kuare also given.
  • Keywords
    Amorphous magnetic films/devices; Ion implantation; Noble gases; Amorphous magnetic materials; Amorphous materials; Anisotropic magnetoresistance; Annealing; Magnetic films; Magnetic properties; Magnetic resonance; Substrates; Thickness measurement; Transistors;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1987.1065710
  • Filename
    1065710