Title :
Low threshold Nd-doped silica planar waveguide laser
Author :
Bonar, J.R. ; Aitchison, J.S. ; Maxwell, G.D. ; Ainslie, B.J.
Author_Institution :
Dept. of Electron. & Electr. Eng., Glasgow Univ.
fDate :
2/3/1994 12:00:00 AM
Abstract :
The authors report high power, high slope efficiency, Nd-doped glass waveguide lasers on Si, fabricated by flame hydrolysis deposition (FHD) and reactive ion etching (RIE). The laser was pumped at 804 nm and achieved a lasing threshold of 20 mW, slope efficiencies of 2.6% and output powers of over 1 mW
Keywords :
chemical vapour deposition; integrated optics; neodymium; optical waveguides; optical workshop techniques; solid lasers; sputter etching; 1 mW; 20 mW; 804 nm; Nd-doped glass waveguide lasers; SiO2-P2O5:Nd; flame hydrolysis deposition; high power; high slope efficiency; lasing threshold; low threshold Nd-doped silica planar waveguide laser; output powers; reactive ion etching;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19940190
