DocumentCode :
1033120
Title :
The application of ion implantation to specific device structures
Author :
Brook, P. ; Hambleton, K.G. ; Large, L.N. ; Whitehead, C.S.
Volume :
15
Issue :
9
fYear :
1968
fDate :
9/1/1968 12:00:00 AM
Firstpage :
687
Lastpage :
687
Keywords :
Bandwidth; Capacitance-voltage characteristics; Detectors; Ion implantation; Laboratories; PIN photodiodes; Photodetectors; Production systems; Schottky diodes; Silicon;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1968.16435
Filename :
1475337
Link To Document :
بازگشت