Abstract :
Diamond MIS capacitors have been fabricated on natural diamond with a CVD SiO2 dielectric. By suitably cleaning the substrate and annealing the deposited film, the authors obtained good silicon dioxide to diamond adhesion. The resulting devices were characterised by current-voltage, capacitance-voltage, and capacitance-time curves under illumination. The authors demonstrated that the devices have leakage current sufficiently low to allow formation of an inversion layer. Devices were biased into deep depletion and then inverted with photogenerated carriers
Keywords :
adhesion; annealing; capacitors; diamond; leakage currents; metal-insulator-semiconductor structures; C; C substrate; C-SiO2; CVD SiO2 dielectric; adhesion; annealing; capacitance-time curve; capacitance-voltage curve; charge storage; current-voltage curve; deep depletion; diamond MIS capacitors; illumination; inversion layer; leakage current; natural diamond; photogenerated carriers; substrate cleaning;