• DocumentCode
    1033151
  • Title

    Observation of charge storage in diamond MIS capacitors

  • Author

    Binari, S.C. ; Moses, D.

  • Volume
    30
  • Issue
    4
  • fYear
    1994
  • fDate
    2/17/1994 12:00:00 AM
  • Firstpage
    365
  • Lastpage
    366
  • Abstract
    Diamond MIS capacitors have been fabricated on natural diamond with a CVD SiO2 dielectric. By suitably cleaning the substrate and annealing the deposited film, the authors obtained good silicon dioxide to diamond adhesion. The resulting devices were characterised by current-voltage, capacitance-voltage, and capacitance-time curves under illumination. The authors demonstrated that the devices have leakage current sufficiently low to allow formation of an inversion layer. Devices were biased into deep depletion and then inverted with photogenerated carriers
  • Keywords
    adhesion; annealing; capacitors; diamond; leakage currents; metal-insulator-semiconductor structures; C; C substrate; C-SiO2; CVD SiO2 dielectric; adhesion; annealing; capacitance-time curve; capacitance-voltage curve; charge storage; current-voltage curve; deep depletion; diamond MIS capacitors; illumination; inversion layer; leakage current; natural diamond; photogenerated carriers; substrate cleaning;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19940053
  • Filename
    267337